The Research activities of the laboratory of Plasma-Surface Interaction Chemistry (ChIPS) are focused on the use of cold plasma for the treatment of materials. This technology, already utilized in some industrial fields (glass, tooling, microelectronics …) is more and more considered for three main reasons : low environment impact, robustness and flexibility. Within this context, our activities develop from TRL 1 to 6 (in close collaboration with Materia Nova R&D center) with strong national and international partnerships. In all cases, our objective is to better understand the phenomena triggered when a cold plasma interacts with a material. To meet this target, our know how is mainly on (i) the development of new plasma sources, (ii) the physico-chemical analysis of the plasma through state-of-the-art diagnostic techniques, (iii) the synthesis of (new) materials in the form of thin films (organic and inorganic) and on the surface functionalization of materials (including nanomaterials) and (iv) the treatment of gas through a coupled plasma-catalysis approach (valorization of CO2, activation of N2). These activities are supported by thorough characterization of the chemistry, the morphology and the microstructure of the treated surfaces by advanced techniques such as XPS, ToF-SIMS, TEM, SEM, XRD or synchrotron-based techniques …. Globally, our experimental strategy consists in correlating the characteristics of plasma with the properties of the treated materials in order to understand the underlying phenomena and therefore improve the properties of these surfaces.