ThunderNIL offers an extremely fast version of thermal nanoimprint lithography (NIL), enabling the patterning of 2D and 3D micro and nano-structures on thin films and surfaces for a broad range of applications. ThunderNIL develops a whole technological solution for nanolithography, based on its Pulsed-NIL technology, from tools, stamps and processes. Pulsed-NIL enables the patterning of surfaces in a single ultrafast thermomechanical cycle of a few tens of microseconds, outperforming in speed – by orders of magnitude – the conventional thermal Nanoimprint Lithography (NIL) and offering advantages in several other respects. Such a disruptive technology also ensures the patterning of sizable surfaces (>100 square centimeters, scalable to larger areas) at extreme resolutions (down to the 10-nm scale), in very short times (< 1 ms, where the only limitation is the speed of the robotic systems handling the substrates or the goods). Pulsed-NIL approach fits in a large class of applications fields where efficient patterning of surfaces at the micro/nanometer scale is required, such as biotech (microfluidics, point of care devices), optoelectronics (photovoltaics, lighting devices, displays), telecommunication (integrated optics, refractive or diffractive optical elements), micro/nano-mechanical systems, products anti-counterfeiting, surface finishing and surface aesthetics , etc…