Wafer Process Systems Inc. was established in 1983 and has since been providing wet process equipment to device and material manufacturers in the Semiconductor, MEMS, Photonics, Solar Cell, RFID, Disc Drive and Flat Panel Display manufacturing industries. Wafer Process Systems Inc. manufactures a complete line of Manual, Semi Automated and Fully Automated Dry In / Dry Out Wet Benches to perform a wide range of process applications such as Pre Deposition Surface Pre Cleans for Oxides and Metals (SC1 and SC2), Oxide Resist Strip (H2SO4/H202), Metal Resist Strip (Organic Solvent Chemistries), Metal Etch (Au, Cu, CR, Al), Nitride Strip, Buffered Oxide Etch, Electroless and Electro Chemical Deposition. Looking for an IPA Dryer? Contact us to receive customer test results for our equipment in field.