CCR Technology is the inventor of the COPRA Plasma Technology® and serves the supply chain of end user, original equipment manufacturers and research groups in markets like optics, solar, semiconductor, wear & decorative coatings, large area glass coatings as well as storage and display media. The business of CCR is all around COPRA Plasma Sources based on a unique 13.56 MHz RF plasma excitation method which is superior due to its power efficiency, scalability and its reliability. Target applications are plasma enhanced chemical vapor deposition "PECVD" of silicon, metal oxides and nitrides for barrier & functional layers, for optical filter stacks as for protective and wear & decorative coatings, as well as the assistence of PVD Processes as f.e. Sputter Assist or E-Gun Assist. CCR Technology is a worldwide serving and independent Plasma Source producer for E-Gun and Sputter Assist Sources as well as suitable for PECVD and Etching applications (even for large area). The CCR “COPRA-Technology” trademark DN-, LS-, RS- and IS-Series are RF-powered ICP-plasma beam sources who are working gas independent, reliable and maintenance poor perfectly suited for industrial production. An integrated Matching-Network as well as the possibility of customization and the freedom of scalability completes our portfolio. With a variety of nearly 50 different standard shapes like flange mount versions or as well as a self-neutralizing Assist source (for your optical coater) which is placed "Inside Vacuum", we will make sure the COPRA fits into your needs.