PLASSYS is a French company founded in 1987. Its main activity consists in designing and manufacturing equipment for thin film deposition and etching. For more than 30 years and counting, many prestigious public and private research centers have relied on PLASSYS expertise and know-how in vacuum technology and vacuum applications. PLASSYS range of product lines covers systems for thermal evaporation, electron beam evaporation, sputtering deposition, diamond growth by CVD, ion gun assisted deposition, and ion etching. PLASSYS technology for thin films is mainly applied in semiconductor, superconductor, sensors, tribological and optical layers industries.