Kalpana Systems is proud to announce an S-ALD technology with a throughput and up-time superior to all currently available alternatives. Among thin-film coating technologies, Atomic Layer Deposition is the one that delivers superior coating conformality, density and stoichiometry while the product remains at atmospheric pressure and low temperature. A broad range of products can be coated with a variety of materials. Kalpana Systems utilises its superspatial precursor separation technology in a new solution which outperforms all competition in throughput as well as uptime. High-volume roll-to-roll ALD is now available to improve manufacturing in many industries.