Plasma Dynamics, LLC is devoted exclusively to the plasma processing of advanced materials by reactive ion etching (RIE) and plasma enhanced chemical vapor deposition (PECVD). The company was founded in 2003 by Dr. Vilnis G. Kreismanis. Located in Wilmington, MA, company services include R&D, consulting on/and process development, as well as low level production. Plasma Dynamics has state-of-the-art plasma etching and deposition systems and a complete set of materials analysis tools. Clients include everything from Fortune 50 to startup companies in the computer, biotech, photonics, failure analysis, advanced display and electronic fields and also major colleges and universities.