ELEMENT 3-5 GmbH

www.element3-5.com

AIXaTECH becomes ELEMENT 3-5! ELEMENT 3-5 GmbH – based in Baesweiler, Germany – is a technology source for the semiconductor industry. The product spectrum ranges from production systems based on the novel low-temperature epitaxy to ion and plasma sources for a wide variety of applications in semiconductor technology. With the ACCELERATOR 3500K, the company currently supplies the most powerful epitaxy system for the production of monocrystalline aluminum nitride templates. A 10-fold higher capacity with significantly reduced gas and energy consumption as well as a significantly increased layer homogeneity characterize the ACCELERATOR 3500K compared to conventional MOCVD systems. Customers in the field of power electronics or the LED business appreciate the significant productivity increases and capacity expansions offered by the ACCELERATOR 3500K. The powerful ICP sources of ELEMENT 3-5 GmbH are mainly used in the field of wafer cleaning and surface activation. Their characteristics are high efficiency at high plasma densities paired with uniform distribution over large areas and volumes.

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AIXaTECH becomes ELEMENT 3-5! ELEMENT 3-5 GmbH – based in Baesweiler, Germany – is a technology source for the semiconductor industry. The product spectrum ranges from production systems based on the novel low-temperature epitaxy to ion and plasma sources for a wide variety of applications in semiconductor technology. With the ACCELERATOR 3500K, the company currently supplies the most powerful epitaxy system for the production of monocrystalline aluminum nitride templates. A 10-fold higher capacity with significantly reduced gas and energy consumption as well as a significantly increased layer homogeneity characterize the ACCELERATOR 3500K compared to conventional MOCVD systems. Customers in the field of power electronics or the LED business appreciate the significant productivity increases and capacity expansions offered by the ACCELERATOR 3500K. The powerful ICP sources of ELEMENT 3-5 GmbH are mainly used in the field of wafer cleaning and surface activation. Their characteristics are high efficiency at high plasma densities paired with uniform distribution over large areas and volumes.

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