Wonik Materials North America is an US-based semiconductor chemicals company operating out of both the US and South Korea in conjunction with partner company Wonik Materials Co Ltd. The company is focused on the development of new chemical precursors for ALD applications in the semiconductor and Hi-tech industries. We pioneered the commercial development of Hexachlorodisilane (HCDS) and we are using that experience as the model to revolutionize our industry in the area of precursor development. Our trademarked slogan Rapid Precursor DevelopmentTM is the embodiment of our company goal to reduce the gap between Research and Development and commercial implementation of products in the semiconductor industry. Through in-house R&D, coordination with our partner Wonik Materials, and customer requested synthesis we plan to grow our recognition and share inside the quickly expanding world of electronic semiconductors and chemical synthesis. About Atomic Layer Deposition: Atomic Layer Deposition (ALD) is an expanded field of chemistry that allows the controlled deposition of single layers of molecules on substrates. This atomic level control has become critical in the semiconductor industry as a means to satisfy the market desire for more and more compact devices. Nova-kem's role in the commercial use of ALD is to provide chemicals (called precursors) used to comprise the semiconductors in these devices as well as being on the leading edge of the next generation of precursors to be used in the industry to continue the progression of technology.