n&k Technology manufactures exceptionally high resolution, state-of-the-art metrology systems for measurements of Optical Critical Dimensions (OCD) and Thin Films for the Semiconductor, Photomask, Data Storage, Flat Panel Display and Solar Cell Industries. n&k’s large family of instruments provide measurements for a large variety of OCD and Thin Film structures that cover current and future applications and are used for the most challenging measurements of today’s high tech industries. The core technology is based on broadband reflectance, utilizing patented reflective optics that provides an optimized signal-to-noise ratio of the measured data. The analysis is based on the Forouhi-Bloomer Dispersion Equations for refractive index (n) and extinction coefficient (k) of thin films, combined with Rigorous Coupled Wave Analysis for OCD structures. n&k Technology’s metrology instruments are field-proven, production-worthy, fast, and non-destructive, enabling process control and yield improvement of technological devices.